On the origin of the dielectric breakdown mechanism in plasma-polymerized hexamethyldisiloxane films
Dielectric breakdown phenomena of plasma-deposited hexamethyldisiloxane are discussed. We show that the deposition conditions and post-treatment can change the dielectric strength. A lowering of the breakdown field was attributed to reactions with oxygen species during or after deposition.
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| Published in | Thin solid films Vol. 170; no. 2; pp. 235 - 240 |
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| Main Authors | , , , |
| Format | Journal Article |
| Language | English |
| Published |
Lausanne
Elsevier B.V
15.03.1989
Elsevier Science |
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| Online Access | Get full text |
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| Abstract | Dielectric breakdown phenomena of plasma-deposited hexamethyldisiloxane are discussed. We show that the deposition conditions and post-treatment can change the dielectric strength. A lowering of the breakdown field was attributed to reactions with oxygen species during or after deposition. |
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| AbstractList | Dielectric breakdown phenomena of plasma-deposited hexamethyldisiloxane are discussed. We show that the deposition conditions and post-treatment can change the dielectric strength. A lowering of the breakdown field was attributed to reactions with oxygen species during or after deposition. |
| Author | Segui, Y. Souag, N. Montalan, D. Laurent, C. |
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| Cites_doi | 10.1109/TEI.1986.348958 10.1016/0040-6090(74)90292-2 10.1016/0040-6090(81)90611-8 10.1063/1.1662588 10.1080/00222338108066441 10.1016/S0065-2539(08)60985-3 10.1016/0014-3057(70)90107-2 10.1109/TEI.1980.298314 10.1051/rphysap:01984001904032500 10.1143/JJAP.21.483 10.1063/1.326178 10.1109/TEI.1984.298829 10.1143/JJAP.21.475 10.1007/BFb0048586 10.1109/TEI.1984.298754 10.1002/app.1984.070291133 10.1002/app.1976.070200618 10.1088/0022-3727/14/10/020 10.1016/0014-3057(69)90076-7 10.1016/0040-6090(83)90403-0 10.1016/0040-6090(87)90063-0 |
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| Keywords | Dimethylsiloxane polymer Dielectric strength Property processing relationship Dielectric properties Plasma deposition Glow discharge polymerization |
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| References | Jonscher, Lacoste (BIB15) 1984; 19 Meek, Craggs (BIB11) 1978 Wrobel, Klemberg, Wertheimer, Schreiber (BIB3) 1981; 15 Ieda (BIB19) 1980; 15 Lacoste, Loudghiri, Meric, Segui (BIB9) 1986 Bell (BIB18) 1980; 94 Shinohara, Kimura (BIB20) 1957; 77 Segui, Moret, Montalan (BIB7) 1984; 19 Hikita, Matsuda, Nagao, Sawa, Ieda (BIB12) 1982; 21 Klein (BIB1) 1969; 26 Kryszewski, Wrobel, Tyczkowski (BIB2) 1979; 108 Segui, Montalan, Bacquet (BIB16) 1987; 155 Montalan (BIB25) March 1986 Inagaki, Kondo, Murakami (BIB5) 1984; 29 Hikita, Matsuda, Nagao, Sawa, Ieda (BIB14) 1982; 21 Tyczkowski, Kryszewski (BIB23) 1981; 14 Morita, Sawa, Ieda (BIB27) 1973; 44 Yang, Kondo, Shimakawa, Inagaki (BIB13) June 1985 Segui, Bagnol, Bui, Pistre, Danto, Barriere (BIB26) 1979; 50 Ieda, Nagao, Hikita, Sawa (BIB21) 1979 Tyczkowski, Kryszewski (BIB22) 1984; 38 Sachdev, Sachdev (BIB4) 1983; 107 Segui, Bui (BIB6) 1976; 20 Lacoste, Muhammad, Segui, Matoumona (BIB8) 1984; 19 Segui, Bui, Carchano (BIB10) 1974; 22 Szeto, Hess (BIB24) 1981; 78 Ramu, Wertheimer (BIB28) 1986; 21 Denaro, Owens, Crawshaw, Denaro, Owens, Crawshaw (BIB17) 1970; 6 Tyczkowski (10.1016/0040-6090(89)90729-3_BIB23) 1981; 14 Morita (10.1016/0040-6090(89)90729-3_BIB27) 1973; 44 Tyczkowski (10.1016/0040-6090(89)90729-3_BIB22) 1984; 38 Jonscher (10.1016/0040-6090(89)90729-3_BIB15) 1984; 19 Montalan (10.1016/0040-6090(89)90729-3_BIB25) 1986 Segui (10.1016/0040-6090(89)90729-3_BIB26) 1979; 50 Wrobel (10.1016/0040-6090(89)90729-3_BIB3) 1981; 15 Lacoste (10.1016/0040-6090(89)90729-3_BIB8) 1984; 19 Denaro (10.1016/0040-6090(89)90729-3_BIB17_2) 1969; 5 Ieda (10.1016/0040-6090(89)90729-3_BIB19) 1980; 15 Szeto (10.1016/0040-6090(89)90729-3_BIB24) 1981; 78 Ramu (10.1016/0040-6090(89)90729-3_BIB28) 1986; 21 Segui (10.1016/0040-6090(89)90729-3_BIB6) 1976; 20 Meek (10.1016/0040-6090(89)90729-3_BIB11) 1978 Klein (10.1016/0040-6090(89)90729-3_BIB1) 1969; 26 Kryszewski (10.1016/0040-6090(89)90729-3_BIB2) 1979; 108 Segui (10.1016/0040-6090(89)90729-3_BIB7) 1984; 19 Bell (10.1016/0040-6090(89)90729-3_BIB18) 1980; 94 Ieda (10.1016/0040-6090(89)90729-3_BIB21) 1979 Yang (10.1016/0040-6090(89)90729-3_BIB13) 1985 Segui (10.1016/0040-6090(89)90729-3_BIB10) 1974; 22 Shinohara (10.1016/0040-6090(89)90729-3_BIB20) 1957; 77 Hikita (10.1016/0040-6090(89)90729-3_BIB14) 1982; 21 Segui (10.1016/0040-6090(89)90729-3_BIB16) 1987; 155 Sachdev (10.1016/0040-6090(89)90729-3_BIB4) 1983; 107 Denaro (10.1016/0040-6090(89)90729-3_BIB17_1) 1970; 6 Inagaki (10.1016/0040-6090(89)90729-3_BIB5) 1984; 29 Lacoste (10.1016/0040-6090(89)90729-3_BIB9) 1986 Hikita (10.1016/0040-6090(89)90729-3_BIB12) 1982; 21 |
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| Snippet | Dielectric breakdown phenomena of plasma-deposited hexamethyldisiloxane are discussed. We show that the deposition conditions and post-treatment can change the... |
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| SubjectTerms | Applied sciences Exact sciences and technology Physicochemistry of polymers Polymerization Polymers and radiations |
| Title | On the origin of the dielectric breakdown mechanism in plasma-polymerized hexamethyldisiloxane films |
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