Experimental and theoretical study of the electrical properties of a triode reactor

• Published in: Surface & coatings technology Vol. 59; no. 1; pp. 54 - 58
• Main Authors: Seeböck, R.J., Köhler, W.E., Römheld, M., Zellhuber, U.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Lausanne Elsevier B.V 01.10.1993; Elsevier
• Subjects: Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physics; Physics of gases, plasmas and electric discharges; Physics of plasmas and electric discharges; Plasma production and heating; Plasma sources; Surface treatments; High-frequency discharges; Electrodes; Electrical properties; Theoretical study; Etching; Experimental study; Chemical reactors; Plasma sources; Deposition; Equivalent circuits
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/0257-8972(93)90054-R

Measurements of time-dependent voltages in a triode plasma reactor are reported, the electrodes of which were powered with high (13.6 MHz) and low (100kHz) frequencies respectively while the vessel wall was grounded. The numerical simulation of these potentials and currents is based on an equivalent circuit model in which three plasma boundary sheaths are considered. Each of these sheaths is modelled by a voltage-dependent capacitor and a diode with an exponential characteristics, connected in parallel. The reactor model together with the external circuits lead to a system of five coupled differential equations for the relevant voltages which is solved by an implicit method. Comparison between the measured and calculated high and low frequency electrode potentials yields good agreement when the plasma electron density is appropriately adjusted.