Microstructure, dielectric properties and hydrogen gas sensitivity of sputtered amorphous Ba0.67Sr0.33TiO3 thin films

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Bibliographic Details
Published inMaterials science & engineering. B, Solid-state materials for advanced technology Vol. 77; no. 2; pp. 177 - 184
Main Authors CHEN, X. F, ZHU, W. G, TAN, O. K
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier 31.08.2000
Subjects
Analytical chemistry
Chemistry
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Electrical properties of specific thin films
Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures
Exact sciences and technology
General, instrumentation
Other inorganic semiconductors
Physics
Chemical sensors
Inorganic compounds
Transition element compounds
Amorphous state
Leakage currents
Experimental study
Fabrication property relation
Film growth
Thin films
Titanium oxides
Magnetrons
Cathode sputtering
Strontium oxides
Barium oxides
Microstructure
IV characteristic
Quaternary compounds
Permittivity
Gas detector
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ISSN:0921-5107
1873-4944
DOI:10.1016/S0921-5107(00)00484-0