High haze textured surface B-doped ZnO-TCO films on wet-chemically etched glass substrates for thin film solar cells

Textured glass substrates with crater-like feature sizes of-5-30 μm were obtained using the chemical etching method through adjusting the treatment round （R）. Pyramid-like boron-doped zinc oxide （ZnO：B） films with feature sizes of -300-800 nm were deposited on the etched glass substrates by the meta...

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Bibliographic Details
Published inJournal of semiconductors Vol. 37; no. 8; pp. 28 - 34
Main Author 陈新亮 刘杰铭 方家 陈泽 赵颖 张晓丹
Format Journal Article
LanguageEnglish
Published 01.08.2016
Subjects
ZnO
化学蚀刻
特征尺寸
玻璃衬底
纹理
薄膜太阳能电池
表面掺杂
透明导电薄膜
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Summary:Textured glass substrates with crater-like feature sizes of-5-30 μm were obtained using the chemical etching method through adjusting the treatment round （R）. Pyramid-like boron-doped zinc oxide （ZnO：B） films with feature sizes of -300-800 nm were deposited on the etched glass substrates by the metal organic chemical deposition （MOCVD） technique using water, diethylzinc and 1%-hydrogen-diluted diborane. The ZnO：B films on the etched glass with micro/nano double textures presented a much stronger light-scattering capability than the conventional ZnO：B on the flat glass and their electrical properties changed little. Typical etched glass-3R/ZnO：B exhibited a high root mean square （RMS） roughness of -160 nm. The haze values at the wavelengths of 550 nm and 850 nm for etched glass-3R/ZnO：B sample were 61% and 42%, respectively. Finally, the optimized etched glass/ZnO：B was applied in the silicon （Si） based thin film solar cells. The high haze etched glass/ZnO：B substrates have potential merits for thin film solar cells.
Bibliography:semiconductors; surfaces; thin films; crystal growth; optical properties
11-5781/TN
Textured glass substrates with crater-like feature sizes of-5-30 μm were obtained using the chemical etching method through adjusting the treatment round （R）. Pyramid-like boron-doped zinc oxide （ZnO：B） films with feature sizes of -300-800 nm were deposited on the etched glass substrates by the metal organic chemical deposition （MOCVD） technique using water, diethylzinc and 1%-hydrogen-diluted diborane. The ZnO：B films on the etched glass with micro/nano double textures presented a much stronger light-scattering capability than the conventional ZnO：B on the flat glass and their electrical properties changed little. Typical etched glass-3R/ZnO：B exhibited a high root mean square （RMS） roughness of -160 nm. The haze values at the wavelengths of 550 nm and 850 nm for etched glass-3R/ZnO：B sample were 61% and 42%, respectively. Finally, the optimized etched glass/ZnO：B was applied in the silicon （Si） based thin film solar cells. The high haze etched glass/ZnO：B substrates have potential merits for thin film solar cells.
ISSN:1674-4926
DOI:10.1088/1674-4926/37/8/083003