Etching characteristics of Si and SiO2 with a low energy argon/hydrogen d.c. plasma source
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Published in | Surface & coatings technology Vol. 97; no. 1-3; pp. 158 - 162 |
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Main Authors | , , , , , , |
Format | Conference Proceeding Journal Article |
Language | English |
Published |
Lausanne
Elsevier
01.12.1997
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Subjects | |
Online Access | Get full text |
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ISSN: | 0257-8972 1879-3347 |
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DOI: | 10.1016/S0257-8972(97)00144-8 |