Adsorption of titanium, chromium, and copper atoms on thin aluminum and magnesium oxide film surfaces

• Published in: Russian physics journal Vol. 54; no. 11; pp. 1226 - 1231
• Main Authors: Tvauri, I. V., Turiev, A. M., Tsidaeva, N. I., Gazzaeva, M. E., Vladimirov, G. G., Magkoev, T. T.
• Format: Journal Article
• Language: English
• Published: Boston Springer US 01.04.2012; Springer
• Subjects: Adsorption; Aluminum oxide; Chemical properties; Chromium; Condensed Matter Physics; Dielectrics; Hadrons; Heavy Ions; Lasers; Magnesium oxide; Mathematical and Computational Physics; Monomolecular films; Nuclear Physics; Optical Devices; Optics; Photonics; Physics; Physics and Astronomy; Theoretical; Titanium; adsorption; work function; chromium; surface; magnesium oxide; titanium; electron spectroscopy; aluminum oxide; copper; thin films
• ISSN: 1064-8887; 1573-9228
• DOI: 10.1007/s11182-012-9735-3

Methods of Auger electron spectroscopy (AES), spectroscopy of characteristic electron energy losses (SCEEL), slow electron diffraction (SED), and contact potential difference (CPD) in ultrahigh vacuum are used to investigate the adsorption-emission properties and stability of two-component film systems formed by putting of Ti, Cr, and Cu atoms on MgO–Mo(011) and Al 2 O 3 –Mo(011) surfaces. All atoms have the properties of electronegative adsorbates. Continuous adatom monolayers are formed on the Al 2 O 3 –Mo(011) system surface, and three-dimensional islands are formed on the MgO–Mo(011) surface. The properties of monoatomic films on the oxide layer surface are close to those observed for bulk materials. No radical changes of the system properties are detected with increasing dielectric layer thickness. The thermal stability of the newly formed structures decreases in the order Ti, Cr, Cu, Al 2 O 3 (MgO), and Mo(011).