Low Resistivity Tin-Doped Copper Nanowires

This letter presents Sn-doped Cu nanowires, Cu(Sn) NWs, synthesized by chemical vapor deposition using Cu and SnCl 2 powders as precursors at low temperature (≤ 400°C) and their electrical properties. The Sn not only plays a role as a catalyst to enhance reduction of Cu, but also as a dopant for Cu(...

Full description

Saved in:
Bibliographic Details
Published inIEEE electron device letters Vol. 34; no. 4; pp. 529 - 531
Main Authors LIN, Ching-Yen, WANG, Chiu-Yen, HUNG, Min-Hsiu, LIU, Tzu-Ling, YEW, Tri-Rung
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.04.2013
Institute of Electrical and Electronics Engineers
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:This letter presents Sn-doped Cu nanowires, Cu(Sn) NWs, synthesized by chemical vapor deposition using Cu and SnCl 2 powders as precursors at low temperature (≤ 400°C) and their electrical properties. The Sn not only plays a role as a catalyst to enhance reduction of Cu, but also as a dopant for Cu(Sn) NWs. The Sn thickness, substrate pretreatment, substrate temperature, process pressure, and precursor compositions are optimized to obtain high-density nanowires. Results show that Cu(Sn) NWs, 30 μm in length and 50-620 nm in diameter, are synthesized successfully at 350°C. The Cu(Sn) NWs exhibit low resistivity (2.84 μΩ-cm), which is the lowest value reported thus far, and a failure current density of 3.16×10 7 A/cm 2 .
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2013.2246133