Low Resistivity Tin-Doped Copper Nanowires
This letter presents Sn-doped Cu nanowires, Cu(Sn) NWs, synthesized by chemical vapor deposition using Cu and SnCl 2 powders as precursors at low temperature (≤ 400°C) and their electrical properties. The Sn not only plays a role as a catalyst to enhance reduction of Cu, but also as a dopant for Cu(...
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Published in | IEEE electron device letters Vol. 34; no. 4; pp. 529 - 531 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
New York, NY
IEEE
01.04.2013
Institute of Electrical and Electronics Engineers |
Subjects | |
Online Access | Get full text |
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Summary: | This letter presents Sn-doped Cu nanowires, Cu(Sn) NWs, synthesized by chemical vapor deposition using Cu and SnCl 2 powders as precursors at low temperature (≤ 400°C) and their electrical properties. The Sn not only plays a role as a catalyst to enhance reduction of Cu, but also as a dopant for Cu(Sn) NWs. The Sn thickness, substrate pretreatment, substrate temperature, process pressure, and precursor compositions are optimized to obtain high-density nanowires. Results show that Cu(Sn) NWs, 30 μm in length and 50-620 nm in diameter, are synthesized successfully at 350°C. The Cu(Sn) NWs exhibit low resistivity (2.84 μΩ-cm), which is the lowest value reported thus far, and a failure current density of 3.16×10 7 A/cm 2 . |
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ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/LED.2013.2246133 |