New thin-film sensor detects nitrogen dioxide
An inexpensive nitrogen dioxide gas sensor has been developed that will be suitable for environmental monitoring applications. The sensor combines semiconductor technology with thin film production. Developed at the University of Wales, UK, the device is prepared by a two-step sputtering-oxidation t...
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Published in | Chemical & Engineering News Archive Vol. 72; no. 40; pp. 40 - 41 |
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Main Author | |
Format | Magazine Article |
Language | English |
Published |
Washington
American Chemical Society
03.10.1994
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Subjects | |
Online Access | Get full text |
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Summary: | An inexpensive nitrogen dioxide gas sensor has been developed that will be suitable for environmental monitoring applications. The sensor combines semiconductor technology with thin film production. Developed at the University of Wales, UK, the device is prepared by a two-step sputtering-oxidation technique. A film of metallic tin is deposited on a platinum contact array on an alumina substrate by radio frequency sputtering from a tin target heated in an atmosphere of argon. The tin is oxidized by heating in an oxygen stream. Operational mechanisms of the device are explained. The sensor is very sensitive to NO sub(2) but shows virtually no response to carbon monoxide, hydrogen, or methane at 200 degree C. At higher temperatures, responses to some other gases occur. Some development work remains, but the device eventually will be commercially available. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 None |
ISSN: | 0009-2347 2157-4936 1520-605X |
DOI: | 10.1021/cen-v072n040.p040 |