Generating MgO bicrystal templates using a two-step ion-beam assisted texturing process
A two-step ion-beam assisted texturing process has been developed to generate 10 nm thick MgO bicrystal templates on technical important substrates. The in-plane tilt grain boundary angle can be selected from nearly the whole range of few to 45° by simply rotating the sample azimuthally with respect...
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Published in | Thin solid films Vol. 517; no. 2; pp. 609 - 612 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
28.11.2008
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | A two-step ion-beam assisted texturing process has been developed to generate 10 nm thick MgO bicrystal templates on technical important substrates. The in-plane tilt grain boundary angle can be selected from nearly the whole range of few to 45° by simply rotating the sample azimuthally with respect to the incident ion beam. Using this process, 10 nm thick, 45-degree in-plane-tilt MgO bicrystal templates and microarrays have been obtained on Si substrates. By choosing appropriate masks, this process may be applied for generating bicrystal arrays of sophisticated geometry and multiple-scale dimension, which are desired for various thin-film electronic device applications. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2008.07.010 |