Generating MgO bicrystal templates using a two-step ion-beam assisted texturing process

A two-step ion-beam assisted texturing process has been developed to generate 10 nm thick MgO bicrystal templates on technical important substrates. The in-plane tilt grain boundary angle can be selected from nearly the whole range of few to 45° by simply rotating the sample azimuthally with respect...

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Bibliographic Details
Published inThin solid films Vol. 517; no. 2; pp. 609 - 612
Main Authors Vallejo, Ronald N., Lu, Rongtao, Wu, Judy Z.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 28.11.2008
Elsevier
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Summary:A two-step ion-beam assisted texturing process has been developed to generate 10 nm thick MgO bicrystal templates on technical important substrates. The in-plane tilt grain boundary angle can be selected from nearly the whole range of few to 45° by simply rotating the sample azimuthally with respect to the incident ion beam. Using this process, 10 nm thick, 45-degree in-plane-tilt MgO bicrystal templates and microarrays have been obtained on Si substrates. By choosing appropriate masks, this process may be applied for generating bicrystal arrays of sophisticated geometry and multiple-scale dimension, which are desired for various thin-film electronic device applications.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2008.07.010