A model of charge transport in thermal SiO2 implanted with Si
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Published in | Solid-state electronics Vol. 33; no. 7; pp. 893 - 905 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Oxford
Elsevier Science
01.07.1990
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Subjects | |
Online Access | Get full text |
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ISSN: | 0038-1101 1879-2405 |
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DOI: | 10.1016/0038-1101(90)90071-L |