Sub-nanometer precision modification of the optical properties of three-dimensional polymer-based photonic crystals

We present a convenient post-fabrication technique to precisely tune the optical properties of polymer-based three-dimensional photonic crystals with sub-nanometer precision. Conventional air-plasma etching is utilized to modify the filling fraction of direct laser written polymer photonic crystals...

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Bibliographic Details
Published inPhotonics and nanostructures Vol. 2; no. 3; pp. 191 - 198
Main Authors von Freymann, Georg, Chan, Timothy Y.M., John, Sajeev, Kitaev, Vladimir, Ozin, Geoffrey A., Deubel, Markus, Wegener, Martin
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.12.2004
Subjects
3D photonic crystals
Plasma etching
Tuning of optical properties
42.25.Fx
3D photonic crystals
42.70.Qs
42.25.Dd
Tuning of optical properties
Plasma etching
81.05.Zx
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Summary:We present a convenient post-fabrication technique to precisely tune the optical properties of polymer-based three-dimensional photonic crystals with sub-nanometer precision. Conventional air-plasma etching is utilized to modify the filling fraction of direct laser written polymer photonic crystals beyond the wavelength-imposed limits. Tuning of the optical properties is monitored in transmission and reflection spectroscopy. A simple model for the etching process is proposed and found to be in good agreement with the experimental observations.
ISSN:1569-4410
1569-4429
DOI:10.1016/j.photonics.2004.10.001