Low temperature chemical vapour deposition of diamond on tungsten carbides using CF4 gas doping for machine tool applications

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Bibliographic Details
Published inVacuum Vol. 46; no. 1; pp. 5 - 8
Main Authors TRAVA-AIROLDI, V. J, NOBREGA, B. N, CORAT, E. J, DEL BOSCO, E, LEITE, N. F, BARANAUSKAS, V
Format Journal Article
LanguageEnglish
Published Oxford Elsevier 1995
Subjects
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Mechanical and acoustical properties
Methods of deposition of films and coatings; film growth and epitaxy
Physical properties of thin films, nonelectronic
Physics
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Films
Synthetic mineral
Carbon tetrafluoride
Diamonds
Crystal growth from vapors
Hardness
Experimental study
Adhesion
Precursor
Cutting tool materials
Substrates
CVD
Characterization
Temperature effects
Nonmetals
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More Information
ISSN:0042-207X
1879-2715
DOI:10.1016/0042-207X(95)80050-6