Silane oxidation study: analysis of data for SiO2 films deposited by low temperature chemical vapour deposition

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Bibliographic Details
Published inThin solid films Vol. 117; no. 3; pp. 211 - 216
Main Authors COBIANU, C, PAVELESCU, C
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier Science 20.07.1984
Subjects
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Crystal growth
Surface reaction
Adsorption
Chemical reaction
Reaction mechanism
Oxidation
Kinetics
Silicon IV Oxides
Experimental study
Chemical vapor deposition
Inorganic compound
Thin film
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ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(84)90288-8