Etching of CoSi2 in HF-based solutions
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Published in | Applied surface science Vol. 89; no. 3; pp. 221 - 227 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier Science
01.07.1995
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Subjects | |
Online Access | Get full text |
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ISSN: | 0169-4332 1873-5584 |
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DOI: | 10.1016/0169-4332(95)00045-3 |