Stoichiometry and friction properties of sputtered MoSx layers

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Bibliographic Details
Published inThin solid films Vol. 129; no. 1-2; pp. 79 - 91
Main Authors DIMIGEN, H, HÜBSCH, H, WILLICH, P, REICHELT, K
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier Science 12.07.1985
Subjects
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Crystal growth
Molybdenum Sulfides
Rutherford backscattering
X ray fluorescence
Transition metal Compounds
Friction coefficient
Chemical composition
Cathodic sputtering
Experimental study
Non stoichiometric composition
Inorganic compound
Thin film
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ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(85)90097-5