Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O

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Bibliographic Details
Published inApplied surface science Vol. 103; no. 4; pp. 331 - 341
Main Authors AARIK, J, KUKLI, K, AIDLA, A, PUNG, L
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier Science 01.12.1996
Subjects
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Thin films
Crystal growth
CVD
Atomic layer method
Adsorption
Surface reactions
Tantalum oxides
Theoretical study
Experimental study
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ISSN:0169-4332
1873-5584
DOI:10.1016/s0169-4332(96)00554-5