An InP-Based Dual-Depletion-Region Electroabsorption Modulator with Low Capacitance and Predicted High Bandwidth

A novel dual-depletion-region electroabsorption modulator (DDR-EAM) based on InP at 1550 nm is fabricated. The measured capacitance and extinction ratio of the DDR-EAM reveal that the dual depletion region structure can reduce the device capacitance significantly without any degradation of extinctio...

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Published inChinese physics letters Vol. 28; no. 11; pp. 114207 - 1-114207-4
Main Authors Shao, Yong-Bo (永波 邵), Zhao, Ling-Juan (玲娟 赵), Yu, Hong-Yan (红艳 于), Qiu, Ji-Fang (吉芳 邱), Qiu, Ying-Ping (应平 邱), Pan, Jiao-Qing (教青 潘), Wang, Bao-Jun (宝军 王), Zhu, Hong-Liang (洪亮 朱), Wang, Wei (圩王)
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.11.2011
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Summary:A novel dual-depletion-region electroabsorption modulator (DDR-EAM) based on InP at 1550 nm is fabricated. The measured capacitance and extinction ratio of the DDR-EAM reveal that the dual depletion region structure can reduce the device capacitance significantly without any degradation of extinction ratio. Moreover, the band-width of the DDR-EAM predicted by using an equivalent circuit model is larger than twice the bandwidth of the conventional lumped-electrode EAM (L-EAM).
Bibliography:ObjectType-Article-1
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content type line 23
ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/28/11/114207