Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography
Centimeter-long fiber Bragg grating phase masks having several thousand periods are fabricated using electron beam lithography and require the stitching together of many electron beam writing fields. Two techniques are used to minimize the effect of phase errors arising from the stitching process. F...
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| Published in | IEEE photonics technology letters Vol. 8; no. 10; pp. 1334 - 1336 |
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| Main Authors | , , , , , , |
| Format | Journal Article |
| Language | English |
| Published |
IEEE
01.10.1996
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| Subjects | |
| Online Access | Get full text |
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| Abstract | Centimeter-long fiber Bragg grating phase masks having several thousand periods are fabricated using electron beam lithography and require the stitching together of many electron beam writing fields. Two techniques are used to minimize the effect of phase errors arising from the stitching process. Fiber Bragg gratings with more than 99.9% reflectivity are photoimprinted using the phase masks and near perfect spectral response is obtained in spite of stitching errors. |
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| AbstractList | Centimeter-long fiber Bragg grating phase masks having several thousand periods are fabricated using electron beam lithography and require the stitching together of many electron beam writing fields. Two techniques are used to minimize the effect of phase errors arising from the stitching process. Fiber Bragg gratings with more than 99.9% reflectivity are photoimprinted using the phase masks and near perfect spectral response is obtained in spite of stitching errors. Centimeter-long fiber Bragg grating phase masks having several thousand periods are fabricated using electron beam lithography and require the stitching together of many electron beam writing fields. Two techniques are used to minimize the effect of phase errors arising from the stitching process. Fiber Bragg gratings with more than 99.9% reflectivity are photoimprinted using the phase masks and near perfect spectral response is obtained in spite of stitching errors |
| Author | Bilodeau, F. Johnson, D.C. Hill, K.O. Albert, J. Theriault, S. Sixt, P. Rooks, M.J. |
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| Cites_doi | 10.1143/JJAP.34.6935 10.1109/LEOS.1995.484605 10.1116/1.587435 10.1063/1.108786 10.1049/el:19950624 10.1515/JOC.1993.14.1.18 |
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| StartPage | 1334 |
| SubjectTerms | Bragg gratings Electron beams Fiber gratings Fiber lasers Lithography Optical reflection Phase measurement Reflectivity Size measurement Wavelength measurement |
| Title | Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography |
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