Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography

Centimeter-long fiber Bragg grating phase masks having several thousand periods are fabricated using electron beam lithography and require the stitching together of many electron beam writing fields. Two techniques are used to minimize the effect of phase errors arising from the stitching process. F...

Full description

Saved in:
Bibliographic Details
Published inIEEE photonics technology letters Vol. 8; no. 10; pp. 1334 - 1336
Main Authors Albert, J., Theriault, S., Bilodeau, F., Johnson, D.C., Hill, K.O., Sixt, P., Rooks, M.J.
Format Journal Article
LanguageEnglish
Published IEEE 01.10.1996
Subjects
Bragg gratings
Electron beams
Fiber gratings
Fiber lasers
Lithography
Optical reflection
Phase measurement
Reflectivity
Size measurement
Wavelength measurement
Online AccessGet full text

Cover

More Information
Summary:Centimeter-long fiber Bragg grating phase masks having several thousand periods are fabricated using electron beam lithography and require the stitching together of many electron beam writing fields. Two techniques are used to minimize the effect of phase errors arising from the stitching process. Fiber Bragg gratings with more than 99.9% reflectivity are photoimprinted using the phase masks and near perfect spectral response is obtained in spite of stitching errors.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1041-1135
1941-0174
DOI:10.1109/68.536646