Composition, microstructure, and properties of CrNx films deposited using medium frequency magnetron sputtering

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Bibliographic Details
Published inApplied surface science Vol. 257; no. 6; pp. 2269 - 2274
Main Authors Kong, Qinghua, Ji, Li, Li, Hongxuan, Liu, Xiaohong, Wang, Yongjun, Chen, Jianmin, Zhou, Huidi
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier 2011
Subjects
Composition and phase identification
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science; rheology
Deposition by sputtering
Exact sciences and technology
Materials science
Mechanical and acoustical properties
Methods of deposition of films and coatings; film growth and epitaxy
Photoemission and photoelectron spectra
Physical properties of thin films, nonelectronic
Physics
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Scanning electron microscopy
films
Tribological properties
Nanoindentation
Mechanical properties
Friction factor
Field emission
Deposition rate
XRD
Hardness
Surface composition
Stainless steels
Columnar structure
N
content
Film growth
Medium frequency magnetron sputtering
Magnetrons
Cathode sputtering
Silicon
Microstructure
CrN
X-ray photoelectron spectra
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ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2010.09.086