Application of large datasets to assess trends in the stability of perovskite photovoltaics through machine learning
Current trends in manufacturing indicate that optimised decision making using new state-of-the-art machine learning (ML) technologies will be used. ML is a versatile technique that rapidly and accurately generates new insights from multifactorial data. The ML approach has been applied to a perovskit...
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Published in | Journal of materials chemistry. A, Materials for energy and sustainability Vol. 12; no. 5; pp. 3122 - 3132 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Cambridge
Royal Society of Chemistry
30.01.2024
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Subjects | |
Online Access | Get full text |
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Summary: | Current trends in manufacturing indicate that optimised decision making using new state-of-the-art machine learning (ML) technologies will be used. ML is a versatile technique that rapidly and accurately generates new insights from multifactorial data. The ML approach has been applied to a perovskite solar cell (PSC) database to elucidate trends in stability and forecast the stability of new configurations. A database consisting of 6038 entries of device characteristics, performance, and stability data was utilised, and a sequential minimal optimisation regression (SMOreg) model was employed to determine the most influential factors governing solar cell stability. When considering sub-sections of data, it was found that
pin-device
architectures provided the best model fittings with a training correlation efficiency of 0.963, compared to 0.699 for all device architectures. By establishing models for each PSC architecture, the analysis allows the identification of materials that can lead to improvements in stability. This paper also attempts to summarise some key challenges and trends in the current research methodologies.
Current trends in manufacturing indicate that optimised decision making using new state-of-the-art machine learning (ML) technologies will be used. |
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Bibliography: | https://doi.org/10.1039/d3ta05966a Electronic supplementary information (ESI) available. See DOI |
ISSN: | 2050-7488 2050-7496 |
DOI: | 10.1039/d3ta05966a |