Effect of seed layer on the ferroelectric properties and leakage current characteristics of sol–gel derived vanadium doped PbZr0.53Ti0.47O3 films

In this paper, we report the ferroelectric properties and leakage current characteristics of vanadium-doped PbZr 0.53 Ti 0.47 O 3 (PZTV) films grown on various seed layers prepared by a sol–gel process. The PZTV multilayered film of ~250-nm-thick showed excellent ferroelectric properties, with a lar...

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Bibliographic Details
Published inJournal of materials science. Materials in electronics Vol. 20; no. 6; pp. 555 - 559
Main Author Valavan, S. E.
Format Journal Article
LanguageEnglish
Published Boston Springer US 01.06.2009
Springer
Springer Nature B.V
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Summary:In this paper, we report the ferroelectric properties and leakage current characteristics of vanadium-doped PbZr 0.53 Ti 0.47 O 3 (PZTV) films grown on various seed layers prepared by a sol–gel process. The PZTV multilayered film of ~250-nm-thick showed excellent ferroelectric properties, with a large remnant polarization ( P r ) of ~30 μC/cm 2 ( E c  ~ 90 kV/cm), a high saturation polarization ( P s ) of ~85 μC/cm 2 for an applied field of 1,000 kV/cm, fatigue-free characteristics of up to ≥ 10 10 switching cycles, and a low leakage current density of 7 × 10 −8 A/cm 2 at 100 kV/cm. X-ray diffraction (XRD), atomic force microscopy (AFM), and scanning electron microscopy (SEM) investigations indicated that PZTV films grown on PbZr 0.53 Ti 0.47 O 3 /PbLa 0.05 TiO 3 (PZT/PLT) seed layers exhibited a dense, well-crystallized microstructure with random orientations and a rather smooth surface morphology.
ISSN:0957-4522
1573-482X
DOI:10.1007/s10854-008-9764-4