Optical characterization of HfO2 by spectroscopic ellipsometry : Dispersion models and direct data inversion

• Published in: Thin solid films Vol. 516; no. 22; pp. 7990 - 7995
• Main Authors: SANCHO-PARRAMON, Jordi, MODREANU, Mircea, BOSCH, Salvador, STCHAKOVSKY, Michel
• Format: Conference Proceeding Journal Article
• Language: English
• Published: Lausanne Elsevier Science 30.09.2008
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Ion and electron beam-assisted deposition; ion plating; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Optical properties of bulk materials and thin films; Optical properties of specific thin films; Physics; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; Temperature dependence; Spectroscopic ellipsometry; Tauc-Lorentz; Refractive index; Hafnium oxide; Crystallinity; Dispersions; Ion beam assisted deposition method; Gallium phosphide; Cody-Lorentz; Thin films; Energy gap; Gate oxide; Complementary MOS technology; Optical properties; Microstructure; Optical coatings; Optical constants; Plasma deposition
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2008.04.007