Si1 ― xGex metal-oxide-semiconductor capacitors with HfTaOx gate dielectrics
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Published in | Thin solid films Vol. 520; no. 1; pp. 101 - 105 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier
31.10.2011
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Subjects | |
Online Access | Get full text |
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ISSN: | 0040-6090 1879-2731 |
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DOI: | 10.1016/j.tsf.2011.06.057 |