Potential of Hexyl Acrylate Monomer as an Initiator in Photo-initiated CVD

The potential of hexyl acrylate as an initiator in photo‐initiated (pi) CVD is explored by demonstrating its auto‐polymerization under ultraviolet (UV) radiation of wavelength 254 nm. Deposition of poly(hexyl acrylate) films on silicon substrates proceeds at high rates, approaching 1.7 µm min−1, at...

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Published inChemical vapor deposition Vol. 20; no. 1-2-3; pp. 5 - 7
Main Authors Suresh, Aravind, Anastasio, Daniel, Burkey, Daniel D.
Format Journal Article
LanguageEnglish
Published Blackwell Publishing Ltd 01.03.2014
Subjects
Acrylates
Chemical vapor deposition
Deposition
Initiators
Monomers
Silicon substrates
Ultraviolet
Wavelengths
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Summary:The potential of hexyl acrylate as an initiator in photo‐initiated (pi) CVD is explored by demonstrating its auto‐polymerization under ultraviolet (UV) radiation of wavelength 254 nm. Deposition of poly(hexyl acrylate) films on silicon substrates proceeds at high rates, approaching 1.7 µm min−1, at a stage temperature of 12.1°C, and the process is observed to be adsorption controlled.
Bibliography:ark:/67375/WNG-XMSH5BM5-2
The authors would like to thank UConn undergraduates Brian Ciezynski, Chris Pacileo, and Leia Dwyer for the data from the iCVD portion of this work.
ArticleID:CVDE201304322
istex:BA93462EADE1458809063413F681750CD4F5E9E6
ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0948-1907
1521-3862
DOI:10.1002/cvde.201304322