Effects of Surface Coating on Cylinder Rods Prepared Using Sputtering Deposition Method with Modulated Magnetic Field

Tungsten (W), carbon (C), and titanium (Ti) thin films were prepared on carbide steel cylinder rods using a new magnetron sputtering deposition method to prevent their corrosion or increase their friction resistance. In this method, plasma was generated between the cylinder rod anode substrate and t...

Full description

Saved in:
Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 49; no. 8; pp. 08JF01 - 08JF01-4
Main Authors Kawasaki, Hiroharu, Shibahara, Katsuki, Ohshima, Tamiko, Yagyu, Yoshihito, Suda, Yoshiaki
Format Journal Article
LanguageEnglish
Published The Japan Society of Applied Physics 01.08.2010
Online AccessGet full text

Cover

More Information
Summary:Tungsten (W), carbon (C), and titanium (Ti) thin films were prepared on carbide steel cylinder rods using a new magnetron sputtering deposition method to prevent their corrosion or increase their friction resistance. In this method, plasma was generated between the cylinder rod anode substrate and the cylinder pipe targets, and it moved toward the axial direction with the generation of a modulated magnetic field by a low-frequency alternating coil current. Experimental results showed that the surface morphology of the film became smooth, and the surface roughness of the film decreased. Deposition rate and film uniformity increased with the use of a modulated magnetic field, and friction coefficient increased as a result of the film preparation used.
Bibliography:Experimental apparatus. Images of plasma movement in the modulated magnetic field. Surface morphologies of the carbide steel substrate (a) and prepared film (b). XPS profiles of Ti 2p 3/2 and O 1s on the film prepared using Ti substrate. XRD spectrum of the film prepared using Ti substrate. Dependence of friction coefficient on the type of target material. Dependence of friction coefficient on postannealing temperature. Amounts of wear on the surface of the substrate, and W, C, and Ti films as parameters of postannealing temperature. Profiles of film thickness and friction coefficient of the films as parameters of magnetic field.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.49.08JF01