The localized corrosion of Al at engineered Cu islands

Arrays of engineered copper islands on an aluminum thin-film matrix have been employed to investigate the role of copper in localized corrosion of Al-Cu alloys. When exposed to dilute NaCl solutions, the engineered samples corrode with a morphology similar to that observed in second-phase particles...

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Bibliographic Details
Published inJOM (1989) Vol. 53; no. 7; pp. 34 - 36
Main Authors Missert, N., Barbour, J. C., Copeland, R. G., Mikkalson, J. E.
Format Journal Article
LanguageEnglish
Published 01.07.2001
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Summary:Arrays of engineered copper islands on an aluminum thin-film matrix have been employed to investigate the role of copper in localized corrosion of Al-Cu alloys. When exposed to dilute NaCl solutions, the engineered samples corrode with a morphology similar to that observed in second-phase particles in real alloys. In-situ fluorescence microscopy allows the observation of oxygen reduction at copper islands during corrosion of the underlying aluminum thin-film matrix. The spacing between engineered copper islands was found to strongly influence the corrosion rate of the surrounding matrix.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1047-4838
1543-1851
DOI:10.1007/s11837-001-0085-9