Contact mechanics of a flexible imprinter for photocured nanoimprint lithography

A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can tr...

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Bibliographic Details
Published inTribology letters Vol. 19; no. 1; pp. 59 - 63
Main Authors McClelland, G.M., Rettner, C.T., Hart, M.W., Carter, K.R., Sanchez, M.I., Best, M.E., Terris, B.D.
Format Journal Article
LanguageEnglish
Published Dordrecht Springer Nature B.V 01.05.2005
Subjects
Information storage
Lithography
Mechanics (physics)
Multilayers
Nanolithography
Photocuring
Substrates
Tribology
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Summary:A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can transfer a pattern evenly to a non-flat substrate. These concepts have been used to pattern magnetic media for high density information storage.
ISSN:1023-8883
1573-2711
DOI:10.1007/s11249-005-4265-6