Investigation of rapid-thermal-processing-induced defects in ion-implanted Czochralski silicon by the magic mirror method

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Bibliographic Details
Published inSemiconductor science and technology Vol. 7; no. 1A; pp. A86 - A90
Main Authors Hahn, S, Kugimiya, K, Yarling, C B, Suga, H, Smith, W L, Blaustein, P R, Takahashi, K
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.01.1992
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/7/1A/016