Use of Equivalent Reactant Feeding in Deposition of Ni–Mn–O Coatings by Molecular Layering

• Published in: Russian journal of applied chemistry Vol. 95; no. 3; pp. 352 - 356
• Main Authors: Ezhov, I. S., Nazarov, D. V., Vishnyakov, P. S., Koshtyal, Yu. M., Rumyantsev, A. M., Kumar, Rajesh, Popovich, A. A., Maksimov, M. Yu
• Format: Journal Article
• Language: English
• Published: Moscow Pleiades Publishing 01.03.2022; Springer Nature B.V
• Subjects: Chemistry; Chemistry and Materials Science; Chemistry/Food Science; Deposition; Discharge; Equivalence; Industrial Chemistry/Chemical Engineering; Inorganic Synthesis and Industrial Inorganic Chemistry; Layering; Manganese; Nickel; Oxygen; Steel structures; Thin films; anodes; oxygen plasma; thin-film electrodes; transition metal oxides; molecular layering
• ISSN: 1070-4272; 1608-3296
• DOI: 10.1134/S107042722203003X

The deposition of Ni–Mn–O thin films by molecular layering with equivalent feeding of organometallic reactants was studied. Bis(cyclopentadienyl)nickel (NiCp 2 ) and tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III) [Mn(thd) 3 ] were used as organometallic reactants. Oxygen-containing plasma was used for forming oxygen-containing structures. The mean increment of the Ni–Mn–O coating thickness in one cycle exceeds the sum of the corresponding values known for NiO and Mn 2 O 3 . At equivalent feeding, the nickel content of the coating exceeds the manganese content. High Coulomb efficiency (100%) of samples with the Ni–Mn–O coating on a steel support as an electrode is due to high reversibility of the electrochemical processes occurring in the course of charging–discharging trials. With an 80-fold increase in the discharging current, the discharging capacity decreases by less than 30%.