Si1-xGex Positive Feedback Field-effect Transistor with Steep Subthreshold Swing for Low-voltage Operation
The most prominent challenge for MOSFET scaling is to reduce power consumption; however, the supply voltage (VDD) cannot be scaled down because of the carrier injection mechanism. To overcome this limit, a new type of field-effect transistor using positive feedback as a carrier injection mechanism (...
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Published in | Journal of semiconductor technology and science Vol. 17; no. 2; pp. 216 - 222 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
대한전자공학회
01.04.2017
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Subjects | |
Online Access | Get full text |
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Summary: | The most prominent challenge for MOSFET scaling is to reduce power consumption; however, the supply voltage (VDD) cannot be scaled down because of the carrier injection mechanism. To overcome this limit, a new type of field-effect transistor using positive feedback as a carrier injection mechanism (FBFET) has been proposed. In this study we have investigated the electrical characteristics of a Si1-xGex FBFET with one gate and one-sided Si3N4 spacer using TCAD simulations. To reduce the drain bias dependency, Si1-xGex was introduced as a low-bandgap material, and the minimum subthreshold swing was obtained as 2.87 mV/dec. This result suggests that a Si1-xGe¬x FBFET is a promising candidate for future low-power devices. KCI Citation Count: 14 |
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Bibliography: | G704-002163.2017.17.2.019 |
ISSN: | 1598-1657 2233-4866 |
DOI: | 10.5573/JSTS.2017.17.2.216 |