Internal Stresses in Plasma Deposited Polymer Film Coatings

• Published in: Inorganic materials : applied research Vol. 10; no. 3; pp. 556 - 559
• Main Authors: Danilaev, M. P., Bogoslov, E. A., Polsky, Yu. E., Yanilkin, I. V., Vakhitov, I. R., Gumarov, A. I., Tagirov, L. R.
• Format: Journal Article
• Language: English
• Published: Moscow Pleiades Publishing 2019; Springer Nature B.V
• Subjects: Atmospheric pressure; Chemistry; Chemistry and Materials Science; Crosslinking; Dependence; Deposition; Film thickness; Gas discharges; Glass substrates; Industrial Chemistry/Chemical Engineering; Inorganic Chemistry; Materials Science; Monomers; Plasma; Plasmochemical Methods of Production and Treatment of Materials; Polymer coatings; Polymer films; Polymerization; Polymers; Polystyrene resins; Residual stress; Thin films; Ultraviolet radiation; barrier discharge plasma; internal stresses in polymer films; polymer films
• ISSN: 2075-1133; 2075-115X
• DOI: 10.1134/S2075113319030079

A technique for measuring the internal stresses in polymer films deposited on a glass substrate in gas discharge plasma is developed. Using this technique, the dependence of internal stress in thin films of polymethylmethacrylate and polystyrene on the deposition time and the current density of the barrier discharge at atmospheric pressure is studied. It is found that, when forming thin polymer coatings from monomers with high polymerization efficiency, the average value of internal stresses is higher than that for coatings obtained from monomers having low polymerization efficiency in barrier discharge plasma at atmospheric pressure. This can be explained by an increase in the specific number of cross-links in the first type of films under the action of ultraviolet radiation from the plasma. The quasi-optimal deposition time of the polymer film coating from styrene is found in which the value of the internal stress is minimal at a film thickness acceptable for a number of practical applications.