Magnetic properties of [Fe65Co35–O/SiO2]n multilayer thin films for high-frequency application

• Published in: Applied physics. A, Materials science & processing Vol. 111; no. 2; pp. 569 - 574
• Main Authors: Wang, Y., Geng, H., Wang, J. B., Nie, S., Wang, L. S., Chen, Y., Peng, D. L.
• Format: Journal Article
• Language: English
• Published: Berlin/Heidelberg Springer-Verlag 01.05.2013; Springer
• Subjects: Characterization and Evaluation of Materials; Coercive force; Coercivity; Condensed Matter Physics; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Deposition by sputtering; Domain effects, magnetization curves, and hysteresis; Exact sciences and technology; Ferromagnetic, antiferromagnetic, and ferrimagnetic resonances; spin-wave resonance; Machines; Magnetic anisotropy; Magnetic properties; Magnetic properties and materials; Magnetic resonances and relaxations in condensed matter, mössbauer effect; Magnetically ordered materials: other intrinsic properties; Magnetization curves, magnetization reversal, hysteresis, barkhausen and related effects; Manufacturing; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Multilayers; Nanotechnology; Optical and Electronic Materials; Physics; Physics and Astronomy; Processes; Silicon dioxide; Silicon substrates; Surfaces and Interfaces; Thin Films; SiO2 Phase; Multilayer Film; Multilayer Thin Film; Static Magnetic Property; SiO2 Layer; Ultrathin films; Grain size; Binary compounds; Iron alloys; Layer thickness; Magnetic measurement; Thin films; Multilayers; Cathode sputtering; Calcium nitride; Silicon oxides; Magnetic anisotropy; Monolayers; High frequency; Microstructure; Cobalt alloys; Magnetic properties
• ISSN: 0947-8396; 1432-0630
• DOI: 10.1007/s00339-012-7259-x

A series of [Fe 65 Co 35 –O/SiO 2 ] n multilayer thin films with different SiO 2 separate layer thicknesses ( t =0–3 nm) and fixed Fe 65 Co 35 –O layer thickness (5.4 nm) have been fabricated on (100) silicon and glass substrates by reactive magnetron co-sputtering. Microstructure analysis and magnetic measurement results show that Fe 65 Co 35 –O grain size and magnetic properties can be adjusted by varying the thickness of SiO 2 layers. All films reveal an evident in-plane uniaxial magnetic anisotropy (IPUMA) when the thickness of SiO 2 monolayer changes from t =0 to 3 nm. The hard axis coercivity ( H ch ) reveals a minimum of 9 Oe at t =1 nm while the easy axis coercivity ( H ce ) exhibits a minimum of 16 Oe at t =2 nm. For t =1 nm and 2 nm, the IPUMA fields ( H k ) are 95 and 207 Oe, the saturation magnetizations ( M s ) are 1.8 and 1.6 T, the real part of the complex permeabilities (below 3.0 GHz) are more than 217 and 104, and the ferromagnetic resonance frequencies ( f r ) are 3.6 and 5.2 GHz, respectively.