Rib waveguides fabricated by means of chemical etching of sol–gel SiO2:TiO2 films

The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO2:TiO2 were produced using the sol–gel method. A photoresist was applied as a mask in the etching process. The soluti...

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Bibliographic Details
Published inOptics communications Vol. 245; no. 1-6; pp. 237 - 242
Main Authors KARASINSKI, P, ROGOZINSKI, R
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 17.01.2005
Elsevier Science
Subjects
Applied sciences
Chemical etching
Circuit properties
Electric, optical and optoelectronic circuits
Electronics
Exact sciences and technology
Integrated optics. Optical fibers and wave guides
Optical and optoelectronic circuits
Optical planar waveguide
Rib waveguide
Sol–gel
Waveguides, couplers, and arrays
Rib waveguide
Chemical etching
Sol–gel
Optical planar waveguide
Integrated optics
Scanning electron microscopy
Lithography
Mask
Experimental study
Thin film
Manufacturing process
Sol gel process
Silicon oxides
Channel waveguide
Optical planar waveguides
Dielectric thin films
Selective etching
Optical waveguide
Masking
Titanium oxide
Ammonium fluorides
Photoresist
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Summary:The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO2:TiO2 were produced using the sol–gel method. A photoresist was applied as a mask in the etching process. The solution of ammonia fluoride NH4F was applied in the processes of chemical etching. The paper presents the determined technological characteristics and the obtained channel rib waveguides.
ISSN:0030-4018
1873-0310
DOI:10.1016/j.optcom.2004.10.074