Catalytic Reaction and Metallic Phase in Atomic Layer Deposition of Al2O3/MgO/Pt Structure

Atomic layer deposition (ALD) of MgO thin films on Pt was examined by in situ real-time spectroscopic ellipsometry (SE) and ex situ X-ray photoelectron spectroscopy (XPS). It is found that Mg-containing carbon species are formed in the MgO/Pt interface, which can be explained by the catalytic nature...

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Bibliographic Details
Published inECS solid state letters Vol. 2; no. 11; pp. N39 - N41
Main Authors Wang, Han, Fu, Kan
Format Journal Article
LanguageEnglish
Published The Electrochemical Society 07.09.2013
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Summary:Atomic layer deposition (ALD) of MgO thin films on Pt was examined by in situ real-time spectroscopic ellipsometry (SE) and ex situ X-ray photoelectron spectroscopy (XPS). It is found that Mg-containing carbon species are formed in the MgO/Pt interface, which can be explained by the catalytic nature of underlying Pt surface. For Al2O3 deposited on MgO surface, two reaction pathways are identified, which lead to the formation of oxidized Al-O and metallic Al-Mg interfacial phases, respectively. In addition, the crystallinity of underlying MgO has a strong impact on the relative compositional ratio between metallic and oxidized interfacial phases.
Bibliography:012311SSL
ISSN:2162-8742
2162-8750
DOI:10.1149/2.012311ssl