Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine

We have used Density Functional Theory (DFT) to study the mechanism of three step atomic layer deposition (ALD) of copper via formate and hydrazine. The technique holds promise for deposition of other transition metals.

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Bibliographic Details
Published inRSC advances Vol. 4; no. 65; pp. 34448 - 34453
Main Authors Dey, Gangotri, Elliott, Simon D.
Format Journal Article
LanguageEnglish
Published 01.01.2014
Subjects
Copper
Decomposition
Density functional theory
Deposition
Formates
Hydrazines
Reduction
Transition metals
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Summary:We have used Density Functional Theory (DFT) to study the mechanism of three step atomic layer deposition (ALD) of copper via formate and hydrazine. The technique holds promise for deposition of other transition metals.
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ISSN:2046-2069
2046-2069
DOI:10.1039/C4RA07003H