Surface characterization of Mo oxynitride films obtained by RF sputtering at various N2 ratios

• Published in: Metals and materials international Vol. 19; no. 1; pp. 55 - 60
• Main Authors: Park, Juyun, Kang, Yong-Cheol
• Format: Journal Article
• Language: English
• Published: Springer The Korean Institute of Metals and Materials 2013; Springer Nature B.V; 대한금속·재료학회
• Subjects: Characterization and Evaluation of Materials; Chemistry and Materials Science; Engineering Thermodynamics; Heat and Mass Transfer; Machines; Magnetic Materials; Magnetism; Manufacturing; Materials Science; Metallic Materials; Processes; Solid Mechanics; 재료공학; AFM; SEM; sputtering; X-ray photoelectron spectroscopy; thin films
• ISSN: 1598-9623; 2005-4149
• DOI: 10.1007/s12540-013-1010-9

Molybdenum oxynitride (MoN x O y ) thin films were deposited on p-type Si(100) wafer by rf magnetron sputtering method at various nitrogen gas ratios. The surface characteristics of deposited thin films were investigated using scanning electron microscopy, atomic force microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy. The thickness of films decreased down to 70 from 1000 nm and the roughness was varied with increasing N 2 gas ratio. The formation of MoN x O y was confirmed by existence of Mo species between Mo δ+ and Mo 5+ oxidation state and ON bond in XP spectra. At 0% of N 2 gas ratio, metallic simple cubic Mo structure was observed. As the N 2 gas ratio increased, Mo nitrate and Mo silicate phases were appeared.