Design of a Vertical Cylinder GaN Junctionless FET based on its GaN-on-GaN Substrate and Electrical Performance
This study presents a comparative analysis of the vertical cylinder and fin-type junctionless field- effect transistors (JLFETs) based on GaN-on-GaN substrates using three-dimensional technical computer-aided design (3D TCAD) simulations. The on-current (Ion) values of the vertical cylinder and fin-...
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Published in | Journal of semiconductor technology and science Vol. 23; no. 6; pp. 359 - 366 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
대한전자공학회
01.12.2023
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Subjects | |
Online Access | Get full text |
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Summary: | This study presents a comparative analysis of the vertical cylinder and fin-type junctionless field- effect transistors (JLFETs) based on GaN-on-GaN substrates using three-dimensional technical computer-aided design (3D TCAD) simulations. The on-current (Ion) values of the vertical cylinder and fin-type JLFETs are 6.45 and 5.63 kA/cm2, respectively. The corresponding off-current (Ioff) of the devices is calculated as 2.51 × 10−10¬ and 9.72 × 10−2¬ A/cm2, respectively. Furthermore, their corresponding Ion/Ioff ratios are 2.57 × 1013 and 5.79 × 104, respectively. Additionally, the Ioff ratio of the devices is 2.58 × 109, and the subthreshold swing (SS) is calculated as 101 and 346 mV/dec, respectively. The static resistance (Ron) and breakdown voltage (BV) represent the figure of merits of the power transistor. Herein, Ron of the vertical cylinder-type device is 0.11 µΩ•cm2, which is lower than 0.62 µΩ•cm2 of the vertical fin-type device, whereas their corresponding BVs are calculated as 2,400 and 2,037 V, respectively. These results show that the BV of the vertical cylinder-type device is ~17.8% higher than that of the vertical fin-type device. Therefore, the vertical cylinder-type GaN JLFET has a higher performance than the vertical fin-type GaN JLFET. Herein, we provide guidance in the designing of high-performance vertical GaN power transistors. KCI Citation Count: 0 |
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ISSN: | 1598-1657 2233-4866 2233-4866 1598-1657 |
DOI: | 10.5573/JSTS.2023.23.6.359 |