A novel multiple super junction power device structure with low specific on-resistance
A novel multiple super junction (MS J) LDMOS power device is proposed to decrease Ron due to lateral and vertical interactions between the N-pillar and P-pillar. In the studied device: multiple layers of SJ are introduced oppositely under surface S J; when compared with 2D-depleting of the conventio...
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Published in | Journal of semiconductors Vol. 35; no. 10; pp. 51 - 55 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
01.10.2014
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Online Access | Get full text |
ISSN | 1674-4926 |
DOI | 10.1088/1674-4926/35/10/104006 |
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Abstract | A novel multiple super junction (MS J) LDMOS power device is proposed to decrease Ron due to lateral and vertical interactions between the N-pillar and P-pillar. In the studied device: multiple layers of SJ are introduced oppositely under surface S J; when compared with 2D-depleting of the conventional super junction (CSJ), a 3D- depleted effect is formed in the MSJ thanks to vertical electric field modulation; and, current distribution is improved by deep drain, which increases the drift doping concentration and results in a lower on-resistance. The high electric field around the drain region by substrate-assisted depleted effect is reduced due to the charge balance result from the electric field shielding effect of the bottom S J, which causes the uniform electric field in the drift region and the high breakdown voltage. The numerical simulation results indicate that the specific on-resistance of the MSJ device is reduced by 42% compared with that of CSJ device, while maintaining a high breakdown voltage; the cell pitch of the device is 12 μm. |
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AbstractList | A novel multiple super junction (MS J) LDMOS power device is proposed to decrease Ron due to lateral and vertical interactions between the N-pillar and P-pillar. In the studied device: multiple layers of SJ are introduced oppositely under surface S J; when compared with 2D-depleting of the conventional super junction (CSJ), a 3D- depleted effect is formed in the MSJ thanks to vertical electric field modulation; and, current distribution is improved by deep drain, which increases the drift doping concentration and results in a lower on-resistance. The high electric field around the drain region by substrate-assisted depleted effect is reduced due to the charge balance result from the electric field shielding effect of the bottom S J, which causes the uniform electric field in the drift region and the high breakdown voltage. The numerical simulation results indicate that the specific on-resistance of the MSJ device is reduced by 42% compared with that of CSJ device, while maintaining a high breakdown voltage; the cell pitch of the device is 12 μm. A novel multiple super junction (MSJ) LDMOS power device is proposed to decrease R sub(on) due to lateral and vertical interactions between the N-pillar and P-pillar. In the studied device: multiple layers of SJ are introduced oppositely under surface SJ; when compared with 2D-depleting of the conventional super junction (CSJ), a 3D-depleted effect is formed in the MSJ thanks to vertical electric field modulation; and, current distribution is improved by deep drain, which increases the drift doping concentration and results in a lower on-resistance. The high electric field around the drain region by substrate-assisted depleted effect is reduced due to the charge balance result from the electric field shielding effect of the bottom SJ, which causes the uniform electric field in the drift region and the high breakdown voltage. The numerical simulation results indicate that the specific on-resistance of the MSJ device is reduced by 42% compared with that of CSJ device, while maintaining a high breakdown voltage; the cell pitch of the device is 12 [mu]m. |
Author | 朱辉 李海鸥 李琦 黄远豪 徐晓宁 赵海亮 |
AuthorAffiliation | Guangxi Experiment Center of Information Science, Guilin University of Electronic Technology, Guilin 541004, China State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
Author_xml | – sequence: 1 fullname: 朱辉 李海鸥 李琦 黄远豪 徐晓宁 赵海亮 |
BookMark | eNo9kE1rAjEQhnOwULX9CyX01MvWTDYf61GkXyD00va6rNlZjazJmmSV_vuuKIWBYd533mF4JmTkvENCHoA9AyuKGSgtMjHnapbLGbChBGNqRMb_xi2ZxLgbRC0EjMnPgjp_xJbu-zbZrkUa-w4D3fXOJOsd7fxpGGs8WjN4KfQm9QHpyaYtbf2Jxg6Nbayh3mUBo42pcgbvyE1TtRHvr31Kvl9fvpbv2erz7WO5WGWGK54ybWB4ROqag8hrEKJWUjVFBUqthZRNs665WdeoAGSNuUTN5hJADGrOm6rKp-TpcrcL_tBjTOXeRoNtWzn0fSyhYExoweZiWFWXVRN8jAGbsgt2X4XfElh5hleeGZVnRmUuL-IZ3hB8vAa33m0O1m3-k0pxDRyYzv8AHgdyWA |
Cites_doi | 10.1109/TED.2003.813460 10.1109/TED.2005.848093 10.1109/TED.2006.877007 10.1109/LED.2009.2023541 |
ContentType | Journal Article |
DBID | 2RA 92L CQIGP W92 ~WA AAYXX CITATION 7SP 7U5 8FD L7M |
DOI | 10.1088/1674-4926/35/10/104006 |
DatabaseName | 维普_期刊 中文科技期刊数据库-CALIS站点 维普中文期刊数据库 中文科技期刊数据库-工程技术 中文科技期刊数据库- 镜像站点 CrossRef Electronics & Communications Abstracts Solid State and Superconductivity Abstracts Technology Research Database Advanced Technologies Database with Aerospace |
DatabaseTitle | CrossRef Solid State and Superconductivity Abstracts Technology Research Database Advanced Technologies Database with Aerospace Electronics & Communications Abstracts |
DatabaseTitleList | Solid State and Superconductivity Abstracts |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Engineering Physics |
DocumentTitleAlternate | A novel multiple super junction power device structure with low specific on-resistance |
EndPage | 55 |
ExternalDocumentID | 10_1088_1674_4926_35_10_104006 662712107 |
GroupedDBID | 02O 042 1WK 2B. 2C0 2RA 4.4 5B3 5VR 5VS 7.M 92H 92I 92L 92R 93N AAGCD AAJIO AALHV AATNI ABHWH ACAFW ACGFO ACGFS ACHIP AEFHF AFUIB AFYNE AHSEE AKPSB ALMA_UNASSIGNED_HOLDINGS ASPBG AVWKF AZFZN BBWZM CCEZO CEBXE CHBEP CJUJL CQIGP CRLBU CUBFJ CW9 EBS EDWGO EJD EQZZN FA0 IJHAN IOP IZVLO JCGBZ KNG KOT M45 N5L NS0 NT- NT. PJBAE Q02 RIN RNS ROL RPA RW3 SY9 TCJ TGT W28 W92 ~WA -SI -S~ 5XA 5XJ AAYXX ACARI AERVB AGQPQ AOAED ARNYC CAJEI CITATION Q-- TGMPQ U1G U5S 7SP 7U5 8FD L7M |
ID | FETCH-LOGICAL-c262t-7c106757d2143d144d656f8a166b455ffbd2cbde6115de35e7095114d2c32faa3 |
ISSN | 1674-4926 |
IngestDate | Thu Jul 10 22:34:50 EDT 2025 Tue Jul 01 03:20:29 EDT 2025 Wed Feb 14 10:36:53 EST 2024 |
IsPeerReviewed | true |
IsScholarly | true |
Issue | 10 |
Language | English |
License | http://iopscience.iop.org/info/page/text-and-data-mining http://iopscience.iop.org/page/copyright |
LinkModel | OpenURL |
MergedId | FETCHMERGED-LOGICAL-c262t-7c106757d2143d144d656f8a166b455ffbd2cbde6115de35e7095114d2c32faa3 |
Notes | Zhu Hui,Li Haiou, Li Qi, Huang Yuanhao, Xu Xiaoning,Zhao Hailiang( 1 Guangxi Experiment Center of Information Science, Guilin University of Electronic Technology, Guilin 541004, China 2 State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China) A novel multiple super junction (MS J) LDMOS power device is proposed to decrease Ron due to lateral and vertical interactions between the N-pillar and P-pillar. In the studied device: multiple layers of SJ are introduced oppositely under surface S J; when compared with 2D-depleting of the conventional super junction (CSJ), a 3D- depleted effect is formed in the MSJ thanks to vertical electric field modulation; and, current distribution is improved by deep drain, which increases the drift doping concentration and results in a lower on-resistance. The high electric field around the drain region by substrate-assisted depleted effect is reduced due to the charge balance result from the electric field shielding effect of the bottom S J, which causes the uniform electric field in the drift region and the high breakdown voltage. The numerical simulation results indicate that the specific on-resistance of the MSJ device is reduced by 42% compared with that of CSJ device, while maintaining a high breakdown voltage; the cell pitch of the device is 12 μm. multiple super junction; 3D-depleted; breakdown voltage; specific on-resistance; electric field shield- ing effect 11-5781/TN ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
PQID | 1800474094 |
PQPubID | 23500 |
PageCount | 5 |
ParticipantIDs | proquest_miscellaneous_1800474094 crossref_primary_10_1088_1674_4926_35_10_104006 chongqing_primary_662712107 |
ProviderPackageCode | CITATION AAYXX |
PublicationCentury | 2000 |
PublicationDate | 2014-10-01 |
PublicationDateYYYYMMDD | 2014-10-01 |
PublicationDate_xml | – month: 10 year: 2014 text: 2014-10-01 day: 01 |
PublicationDecade | 2010 |
PublicationTitle | Journal of semiconductors |
PublicationTitleAlternate | Chinese Journal of Semiconductors |
PublicationYear | 2014 |
References | Onishi Y (8) 2008 Rub M (1) 2006 2 3 6 7 Duan B X (9) 2007; 28 Chen W J (4) 2007; 28 Wu W (5) 2013; 22 Permthammasin K (10) 2006 |
References_xml | – volume: 22 start-page: 637 issn: 1674-1056 year: 2013 ident: 5 publication-title: Chin Phys – ident: 2 doi: 10.1109/TED.2003.813460 – ident: 7 doi: 10.1109/TED.2005.848093 – start-page: 1 year: 2006 ident: 1 – start-page: 111 year: 2008 ident: 8 – ident: 3 doi: 10.1109/TED.2006.877007 – start-page: 263 year: 2006 ident: 10 – volume: 28 start-page: 355 issn: 0899-9988 year: 2007 ident: 4 publication-title: Chinese Journal of Semiconductors – volume: 28 start-page: 166 issn: 0899-9988 year: 2007 ident: 9 publication-title: Chinese Journal of Semiconductors – ident: 6 doi: 10.1109/LED.2009.2023541 |
SSID | ssj0067441 |
Score | 1.9240692 |
Snippet | A novel multiple super junction (MS J) LDMOS power device is proposed to decrease Ron due to lateral and vertical interactions between the N-pillar and... A novel multiple super junction (MSJ) LDMOS power device is proposed to decrease R sub(on) due to lateral and vertical interactions between the N-pillar and... |
SourceID | proquest crossref chongqing |
SourceType | Aggregation Database Index Database Publisher |
StartPage | 51 |
SubjectTerms | Devices Drains Drift Electric fields Electric potential Electronic devices MOS功率器件 Semiconductors Voltage 击穿电压 器件结构 导通电阻 掺杂浓度 电场调制 电流分布 相互作用 |
Title | A novel multiple super junction power device structure with low specific on-resistance |
URI | http://lib.cqvip.com/qk/94689X/201410/662712107.html https://www.proquest.com/docview/1800474094 |
Volume | 35 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV3dT9swELcG0yR4mAYDUdgmI_FWhRInTtLHCoEY4mtSOxVeLDtxaBGKC202aX89d06dtlofgBfLurZO5fvlfHe-D0IO4nbSxusqeL_DwAu5Sr1Eaealkgdgu_maS0xOvryKznrheZ_3XaPxaXbJRB2m_5bmlbyHq0ADvmKW7Bs4Wy8KBJgDf2EEDsP4Kh53moX5ox9nUYHjcqSfmw9wVlm2jrAFGuZFDW0hWawUi_cF1vf6aP42Mc0SQ4WapvDA7EZV0mHgf311jGH0psD6sGZ2BXQ3KO3pVQ7r0J6qD7YcmnKR9Gs4w9DUS30Lk4E0864HYKgLYnPSMopDDysOzovTqvqIg83RUjENog09Bu7nMA-4dSHYAcTKkurYV9fitHdxIbon_e4K-cjALEBB_PP6xp28sJztVFqv6zLCwcivaa2Aw19oVU_BghoDU9w_gZqwqJgsnstW2eh-IZ-nu047Fcs3yAddbJL1udqRm-STjd1Nx1_J7w61MKAOBtTCgDoYUAsDWsGA1jCgCAMKMKAOBnQBBlukd3rSPT7zpu0yvJRFbOLFKZYD5HHG4LXLwFDOQFfPE-lHkQo5z3OVsVRlOgIjINMB1zGq134I1IDlUgbbZLUwhd4hVLE8UnGqpI5YKFmScJb7Gm_cVTuXSjXIXr1vYlSVRRHYSgDL0cUN0nI7WX9oYx2SRCAfBPJBBLwiIh8aZN9tuADxhndWstCmHAs_wXqm6ITYfcV39sjaDKffyCrsqP4OSuNE_bBIeQEPZmq3 |
linkProvider | IOP Publishing |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=A+novel+multiple+super+junction+power+device+structure+with+low+specific+on-resistance&rft.jtitle=Journal+of+semiconductors&rft.au=Zhu%2C+Hui&rft.au=Li%2C+Haiou&rft.au=Li%2C+Qi&rft.au=Huang%2C+Yuanhao&rft.date=2014-10-01&rft.issn=1674-4926&rft.volume=35&rft.issue=10&rft_id=info:doi/10.1088%2F1674-4926%2F35%2F10%2F104006&rft.externalDBID=NO_FULL_TEXT |
thumbnail_s | http://utb.summon.serialssolutions.com/2.0.0/image/custom?url=http%3A%2F%2Fimage.cqvip.com%2Fvip1000%2Fqk%2F94689X%2F94689X.jpg |