Shaped beams from circular apertures and arrays with uniform amplitude
Shaped beams patterns with acceptable ripple and sidelobe levels are analyzed. The method used can be applied to circular apertures and circular grid arrays to synthesize rotationally symmetrical flat-topped beams with acceptable ripple and sidelobe levels. This can be extended to rectangular grid p...
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Published in | Electronics letters Vol. 36; no. 14; pp. 1180 - 1182 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
06.07.2000
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Online Access | Get full text |
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Summary: | Shaped beams patterns with acceptable ripple and sidelobe levels are analyzed. The method used can be applied to circular apertures and circular grid arrays to synthesize rotationally symmetrical flat-topped beams with acceptable ripple and sidelobe levels. This can be extended to rectangular grid planar arrays possessing an elliptical boundary by carrying out one-dimensional linear stretching, creating a pattern that has a flat-topped beam with an elliptical contour, surrounded by ring sidelobes also having an elliptical contour but with the amplitude and sidelobe level still controlled. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0013-5194 |
DOI: | 10.1049/el:20000903 |