Electron-beam lithography for the magnetic recording industry: fabrication of nanoscale (10 nm) thin-film read heads

• Published in: Microelectronic engineering Vol. 73-74; pp. 547 - 552
• Main Authors: DRISKILL-SMITH, A. A. G, KATINE, J. A, DRUIST, D. P, LEE, K. Y, TIBERIO, R. C, CHIU, A
• Format: Conference Proceeding Journal Article
• Language: English
• Published: Amsterdam Elsevier Science 01.06.2004
• Subjects: Applied sciences; Electronics; Exact sciences and technology; Magnetoelectric, magnetostrictive, magnetoacoustic, magnetooptic and magnetothermal devices. Spintronics; Microelectronic fabrication (materials and surfaces technology); Miscellaneous; Recording and replay of audio and video signals; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Storage and reproduction of information; Magnetoresistive device; Magnetoresistive thin-film head; Unit production; Critical size; Electron beam lithography; Critical parameter; Recording head; Thin film; Microelectronic fabrication; Test; Electronics industry; Line width; Electron-beam lithography; Resist; Magnetic head; Delay time; Read head; Wafer; Magnetic recording