Electron-beam lithography for the magnetic recording industry: fabrication of nanoscale (10 nm) thin-film read heads

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Bibliographic Details
Published inMicroelectronic engineering Vol. 73-74; pp. 547 - 552
Main Authors DRISKILL-SMITH, A. A. G, KATINE, J. A, DRUIST, D. P, LEE, K. Y, TIBERIO, R. C, CHIU, A
Format Conference Proceeding Journal Article
LanguageEnglish
Published Amsterdam Elsevier Science 01.06.2004
Subjects
Applied sciences
Electronics
Exact sciences and technology
Magnetoelectric, magnetostrictive, magnetoacoustic, magnetooptic and magnetothermal devices. Spintronics
Microelectronic fabrication (materials and surfaces technology)
Miscellaneous
Recording and replay of audio and video signals
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Storage and reproduction of information
Magnetoresistive device
Magnetoresistive thin-film head
Unit production
Critical size
Electron beam lithography
Critical parameter
Recording head
Thin film
Microelectronic fabrication
Test
Electronics industry
Line width
Electron-beam lithography
Resist
Magnetic head
Delay time
Read head
Wafer
Magnetic recording
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ISSN:0167-9317
1873-5568
DOI:10.1016/s0167-9317(04)00137-6