Densification of Chemical Vapor Deposition Silicon Dioxide Film Using Ozone Treatment

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 48; no. 10; p. 101401
Main Authors Kawase, Kazumasa, Noda, Seiji, Nakai, Takafumi, Uehara, Yasushi
Format Journal Article
LanguageEnglish
Published 01.10.2009
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.48.101401