Influence of bias voltage on the microstructure and mechanical properties of TiZrN coatings prepared by reactive magnetron sputtering in industrial conditions

• Published in: Surface & coatings technology Vol. 511; p. 132240
• Main Authors: Behrangi, Sahand, Souček, Pavel, Buršíková, Vilma, Fekete, Matej, Vašina, Petr
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.09.2025
• Subjects: Bias voltage; Hardness; Lattice parameter; Magnetron sputtering; Microstructure; Stress; Lattice parameter; Magnetron sputtering; Microstructure; Hardness; Bias voltage; Stress
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2025.132240

TiZrN coatings were prepared using three bias voltages of −50 V, −100 V and −175 V via a combinatorial approach, which led to the coatings with different Ti/(Ti+Zr) values. The deposition rate of TiN and ZrN remained practically constant with increasing the bias voltage. The TiZrN coatings, however, exhibited a drop of ∼15% in their deposition rates with increasing the bias voltage. The microstructure of TiN and ZrN did not change with the bias voltage applied, unlike TiZrN, which underwent microstructural changes with increasing bias voltage. For all binary and ternary nitrides, the lattice parameter increased and crystallite size decreased with increasing the bias voltage. All TiN, ZrN and TiZrN coatings showed enhanced compressive stress with increasing the bias voltage. ZrN hardness peaked at the bias voltage of −100 V, in contrast to that of TiN, which exhibited a constant increase with the bias voltage and peaked at −175 V. In ternary nitrides, bias voltage significantly influenced the hardness values, whereas in the case of Ti/(Ti+Zr), the effect was minimal, especially at the higher bias voltages. For all binary and ternary coatings, H/Eef and H3/Eef2 increased with the bias voltage, indicating an enhanced wear resistance and resilience with increasing bias voltage. •Higher bias voltage minimally affected TiN and ZrN deposition rates; unlike TiZrN.•All coatings showed grain refinement as bias voltage increased.•TiZrN microstructure changed with bias voltage, unlike TiN and ZrN.•Compressive stress in all coatings increased with higher bias voltage.•H/Eef and H3/Eef2 ratios increased for all coatings with bias voltage.