High-performance, low-area-overhead, and low-delay triple-node-upset self-recoverable latch design based on stacked transistors
Due to the gradual reduction in the feature size of transistors in integrated circuits (ICs), triple-node-upsets (TNUs) caused by the striking of energetic particles in harsh radiation environments have become a considerable reliability concern for ICs. To overcome the limitations of current radiati...
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Published in | Microelectronics and reliability Vol. 172; p. 115830 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier Ltd
01.09.2025
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Subjects | |
Online Access | Get full text |
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Summary: | Due to the gradual reduction in the feature size of transistors in integrated circuits (ICs), triple-node-upsets (TNUs) caused by the striking of energetic particles in harsh radiation environments have become a considerable reliability concern for ICs. To overcome the limitations of current radiation-hardened designs regarding overhead and reliability, this paper proposes a high-performance, low-area-overhead, and low-delay TNU self-recoverable latch (HLLT) based on N-type stacked transistors for aerospace applications. The proposed HLLT latch comprises three symmetrical modules that protect each other. In addition, high-speed path and clock gating technology are employed to reduce delay overhead and power consumption, respectively. Simulation results show that, compared to five existing TNU-recoverable latches, the proposed HLLT latch achieves average reductions of 29.97 %, 57.12 %, 36.52 %, and 83.00 % in area overhead, power consumption, delay, and area-power-delay-product (APDP), respectively. Furthermore, the proposed HLLT latch has lower sensitivity and better stability to variations in PVT (Process, Voltage, Temperature).
•This paper proposes a triple-node upset self-recoverable latch based on N-type stacked transistors.•The new latch comprises three symmetrical modules that protect each other.•There is a low area-overhead and low delay compared to existing same-type structures.•Insensitivity to variations in voltage, temperature, and threshold voltage. |
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ISSN: | 0026-2714 |
DOI: | 10.1016/j.microrel.2025.115830 |