Physical origin investigation of the flatband voltage roll off for metal-oxide-semiconductor device with high-k/metal gate structure
The physical origin of the flatband voltage (VFB) roll off for a metal-oxide-semiconductor device with high-k/metal gate structure is studied from the viewpoint of energy band alignment at the high-k/Si interface because the thickness of SiO2 interlayer is thin enough to be ignored. The VFB roll off...
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Published in | Journal of semiconductors Vol. 36; no. 9; pp. 71 - 74 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
01.09.2015
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Subjects | |
Online Access | Get full text |
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Summary: | The physical origin of the flatband voltage (VFB) roll off for a metal-oxide-semiconductor device with high-k/metal gate structure is studied from the viewpoint of energy band alignment at the high-k/Si interface because the thickness of SiO2 interlayer is thin enough to be ignored. The VFB roll off phenomenon is assigned to associate with the direct electron transfer between high-k and Si substrate. Quantitatively calculated simulation results based on this model are given considering different conditions. |
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Bibliography: | high-k dielectric; band alignment; VFB roll off 11-5781/TN The physical origin of the flatband voltage (VFB) roll off for a metal-oxide-semiconductor device with high-k/metal gate structure is studied from the viewpoint of energy band alignment at the high-k/Si interface because the thickness of SiO2 interlayer is thin enough to be ignored. The VFB roll off phenomenon is assigned to associate with the direct electron transfer between high-k and Si substrate. Quantitatively calculated simulation results based on this model are given considering different conditions. ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1674-4926 |
DOI: | 10.1088/1674-4926/36/9/094006 |