Ferrimagnetism and ferromagnetism behavior in (C, Mn) co-doped SnO2 for microwave and spintronic: Ab initio investigation

•The C-doped SnO2 induced a new state resulting the half-metallic characteristic.•The Sn0.98Mn0.02O2 shows the antiferromagnetic (AFM) stability belongs to super-exchange coupling type.•For Sn0.98Mn0.02(O1-xCx)2 system, we predicted two statements, the presence of the FM and the ferrimagnetic stabil...

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Published inJournal of magnetism and magnetic materials Vol. 483; pp. 219 - 223
Main Authors Ziat, Younes, Hammi, Maryama, Zarhri, Zakaryaa, Laghlimi, Charaf, El Rhazouani, Omar
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.08.2019
Elsevier BV
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Summary:•The C-doped SnO2 induced a new state resulting the half-metallic characteristic.•The Sn0.98Mn0.02O2 shows the antiferromagnetic (AFM) stability belongs to super-exchange coupling type.•For Sn0.98Mn0.02(O1-xCx)2 system, we predicted two statements, the presence of the FM and the ferrimagnetic stabilities. In this paper, the challenge is to investigate the possibility to have the ferromagnetic or/and ferrimagnetic behavior connected to Sn0.98Mn0.02(O1-xCx)2 system at low concentration (x = 0.02, 0.03, 0.04 and 0.05) at room temperature (RT). We utilized the Korringa-Kohn-Rostoker method combined with the Coherent Potential Approximation (KKR-CPA). The C-doped SnO2 induced the half-metallic characteristic located on the Fermi level and the presence of the double-exchange coupling type belongs to the ferromagnetic (FM). The Sn0.98Mn0.02O2 shows the antiferromagnetic (AFM) stability belongs to super-exchange coupling type. For Sn0.98Mn0.02(O1-xCx)2 system, we predicted two statements, the presence of the FM stability where (x = 0.03) and the ferrimagnetic stability where (x = 0.02, 0.04, 0.05). The Curie temperature (TC) can be estimated within the mean field approximation (MFA), our calculations predicted 358.45 K for Sn(O0.95C0.05)2 and 402.26 K for Sn0.98Mn0.02(O0.95C0.05)2. The ferrimagnetic materials are useful for many applications.
ISSN:0304-8853
1873-4766
DOI:10.1016/j.jmmm.2019.03.084