Effect of hydrogen on deposition of tantalum nitride thin films from ethylimidotantalum complex

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Bibliographic Details
Published inJournal of materials science letters Vol. 11; no. 9; pp. 570 - 572
Main Authors Chiu, Hsin-Tien, Chang, Wen-Ping
Format Journal Article
LanguageEnglish
Published Dordrecht Kluwer Academic Publishers 01.01.1992
Subjects
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Solid surfaces and solid-solid interfaces
Surface and interface dynamics and vibrations
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Crystal growth
Tantalum Nitrides
Temperature
Transition metal Compounds
Low pressure
Organometallic compound
Kinetics
Experimental study
Controlled atmosphere
Chemical vapor deposition
Inorganic compound
Thin film
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ISSN:0261-8028
1573-4811
DOI:10.1007/BF00728611