Self-consistent simulation of pulsed and continuous microwave discharges in hydrogen

Results are presented from numerical simulations of pulse-periodic and continuous microwave discharges in hydrogen that are used in CVD reactors for chemical vapor deposition of diamond films. Attention is focused on the processes that should be taken into account in order to construct the simplest...

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Bibliographic Details
Published inPlasma physics reports Vol. 31; no. 11; pp. 965 - 977
Main Authors Koldanov, V. A., Gorbachev, A. M., Vikharev, A. L., Radishchev, D. B.
Format Journal Article
LanguageEnglish
Published United States 01.11.2005
Subjects
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
CHEMICAL VAPOR DEPOSITION
DIAMONDS
EXCITATION
HIGH-FREQUENCY DISCHARGES
HYDROGEN
MATERIALS SCIENCE
MOLECULES
PERIODICITY
PLASMA
PLASMA SIMULATION
THIN FILMS
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Summary:Results are presented from numerical simulations of pulse-periodic and continuous microwave discharges in hydrogen that are used in CVD reactors for chemical vapor deposition of diamond films. Attention is focused on the processes that should be taken into account in order to construct the simplest possible adequate numerical model. It is shown that the processes of vibrational excitation of hydrogen molecules, as well as chemical reactions, play an important role in the establishment of energy balance within the discharges. The results of numerical simulations are compared to the experimental data.
ISSN:1063-780X
1562-6938
DOI:10.1134/1.2131133