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Atomistic mechanism of AlCu thin film alloy growth on trenched Si substrate

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Bibliographic Details
Published inComputational materials science Vol. 232; p. 112681
Main Authors Lablali, M., Mes-adi, H., Eddiai, A., Mazroui, M.
Format Journal Article
LanguageEnglish
Published 25.01.2024
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ISSN:0927-0256
DOI:10.1016/j.commatsci.2023.112681
  • ikona citování Cite this
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